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'Polymer, Chemically Amplified Positive Resist Composition, Resist Patterning Process, And Mask Blank' in Patent Application Approval Process (USPTO 20240134280)
Published: May 10, 2024 by Japan Daily Report
INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "SILICONE RUBBER PARTICLES AND AQUEOUS DISPERSION OF SILICONE RUBBER PARTICLES"
Published: May 06, 2024 by U.S. Fed News
INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD,., 信越化学工業株式会社 FILES APPLICATION FOR "ORGANOPOLYSILOXANE, ADHESION-IMPARTING AGENT, AQUEOUS COATING MATERIAL COMPOSITION AND PRIMER COMPOSITION"
Published: May 06, 2024 by U.S. Fed News
INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "COATING AGENT"
Published: May 06, 2024 by U.S. Fed News
Patent Application Titled 'Onium Salt Type Monomer, Polymer, Chemically Amplified Resist Composition, And Pattern Forming Process' Published Online (USPTO 20240126168)
Published: May 06, 2024 by Health & Medicine Business Daily

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