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Recent Articles

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U.S. Patent and Trademark Office Receives Taiwan Semiconductor Mfg Company's Patent Application for Etchant for Etching a Cobalt-Containing Member in a Semiconductor Structure and Method of Etching a Cobalt-Containing Member in a Semiconductor Structure

Taiwan Semiconductor Mfg Granted Patent for Cobalt Fill for Gate Structures

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 15 for "Cobalt fill for gate structures" (Taiwanese Inventors)

PT Vale Indonesia signs agreement with Huayou Cobalt

Taiwan Semiconductor Mfg Submits Patent Application for Cobalt Fill for Gate Structures

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