US patent issued to South Korea-based Choongwae for high-barrier multilayer film for functional medical solution product; film consists of layers of PU, EVA, polyamide, propylene-based polymer

Andrew Rogers

ALEXANDRIA, Virginia , January 15, 2013 (U.S. Fed News) – United States Patent no. 8,349,440, issued on Jan. 8, was assigned to Choongwae Corp. (South Korea).

"High Barrier Multilayer Film for Functional Medical Solution Product" was invented by Sung-Man Lee (Yongin-si, South Korea) and Jin-Sung Moon (Pyeongtaek-si, South Korea).

According to the abstract released by the U.S. Patent & Trademark Office: "The present invention relates to a high barrier multilayer film for functional medical solution product comprising in order, an outer layer comprising polyethyleneterephthalate deposited inorganic oxide thereon; a first adhesive layer comprising ester type polyurethane; a first intermediate layer comprising ethylene vinyl alcohol copolymer; a second adhesive layer comprising ester type polyurethane; a second intermediate layer comprising polyamide; a third adhesive layer comprising ester type polyurethane; and an inner layer comprising propylene-based polymer. The multilayer film has the merits of improved transparency, heat resistance, sealing property, durability, competitive price, oxygen barrier property and less pinhole, so that may be applied to a outer bag of pouch type container of medical solution."

The patent was filed on Dec. 19, 2008, under Application No. 12/810,234.

For further information please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8349440&OS=8349440&RS=8349440

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