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US Patent Issued to Taiwan Semiconductor Manufacturing on April 23 for "Localized heating in laser annealing process" (Belgian, American Inventors)

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 23 for "Method for forming package structure with cavity substrate" (Taiwanese Inventors)

US Patent Issued to ADVANCED MICRO DEVICES on April 23 for "Methods and apparatus for synchronizing data transfers across clock domains using heads-up indications" (Colorado, Texas Inventors)

US Patent Issued to Sumitomo Chemical on April 23 for "Nitride semiconductor substrate, laminate, substrate selection program, substrate data output program, off-angle coordinate map, and methods thereof" (Japanese Inventors)

Intel stock price forecast: death cross nears ahead of earnings

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