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Recent Articles

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Taiwan Semiconductor Mfg Granted United States Patent for Method of Critical Dimension Control by Oxygen and Nitrogen Plasma Treatment in Euv Mask
Published: April 18, 2024 by Semiconductor Patent News
Patent Issued for Profile control of gate structures in semiconductor devices (USPTO 11948939)
Published: April 18, 2024 by Daily Asia Business
Patent Issued for Memory device (USPTO 11947828)
Published: April 18, 2024 by Network Business Daily
Patent Issued for High voltage polysilicon gate in high-K metal gate device (USPTO 11950413)
Published: April 18, 2024 by Technology Business Daily
Patent Issued for Etch barrier for microelectronic packaging conductive structures (USPTO 11948898)
Published: April 18, 2024 by Electronic Business Daily

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